In situ monitoring of the growth of oxide thin films at high oxygen pressure
Klein, J, Höfener, C, Alff, L, Gross, RVolume:
12
Language:
english
Journal:
Superconductor Science and Technology
DOI:
10.1088/0953-2048/12/11/398
Date:
November, 1999
File:
PDF, 269 KB
english, 1999