A general approach for high yield fabrication of...

Nanotechnology 2012 / 03 Vol. 23; Iss. 12

A general approach for high yield fabrication of CMOS-compatible all-semiconducting carbon nanotube field effect transistors

Islam, Muhammad R, Kormondy, Kristy J, Silbar, Eliot, Khondaker, Saiful I
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Volume:
23
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/23/12/125201
Date:
March, 2012
File:
PDF, 690 KB
english, 2012
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