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Improvement of the 2D dynamic CA method for photoresist etching simulation and its application to deep UV lithography simulations of SU-8 photoresists
Zhou, Zai-Fa, Huang, Qing-An, Li, Wei-Hua, Feng, Ming, Lu, Wei, Zhu, ZhenVolume:
17
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/17/12/021
Date:
December, 2007
File:
PDF, 799 KB
english, 2007