Etch product identification during - RIE of InP using mass...

Plasma Sources Science and Technology 1997 / 11 Vol. 6; Iss. 4

Etch product identification during - RIE of InP using mass spectrometry

Feurprier, Y, Cardinaud, Ch, Grolleau, B, Turban, G
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Volume:
6
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/6/4/014
Date:
November, 1997
File:
PDF, 219 KB
english, 1997
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