Real-time determination of plasma etch-rate selectivity

Plasma Sources Science and Technology 1998 / 11 Vol. 7; Iss. 4

Real-time determination of plasma etch-rate selectivity

Sarfaty, Moshe, Baum, Chris, Harper, Michael, Hershkowitz, Noah, Shohet, J Leon
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Volume:
7
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/7/4/015
Date:
November, 1998
File:
PDF, 240 KB
english, 1998
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