Sheath Characteristic in ECR Plasma Nitriding

Plasma Science and Technology 2001 / 04 Vol. 3; Iss. 2

Sheath Characteristic in ECR Plasma Nitriding

Wei-dong, Huang, Min, Hu, Ru-juan, Zhan
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Volume:
3
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/3/2/009
Date:
April, 2001
File:
PDF, 371 KB
english, 2001
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