Negative charge injection to a wafer in a pulsed...

Negative charge injection to a wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching; diagnostics by emission-selected computerized tomography

Ohmori, Takeshi, Goto, Takeshi, Makabe, Toshiaki
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Volume:
37
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/37/16/003
Date:
August, 2004
File:
PDF, 1.15 MB
english, 2004
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