Negative charge injection to a wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching; diagnostics by emission-selected computerized tomography
Ohmori, Takeshi, Goto, Takeshi, Makabe, ToshiakiVolume:
37
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/37/16/003
Date:
August, 2004
File:
PDF, 1.15 MB
english, 2004