A semi-quantitative model for the deposition rate in...

Journal of Physics D Applied Physics 2008 / 11 Vol. 41; Iss. 21

A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering

Sarakinos, K, Alami, J, Dukwen, J, Woerdenweber, J, Wuttig, M
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
41
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/41/21/215301
Date:
November, 2008
File:
PDF, 427 KB
english, 2008
Conversion to is in progress
Conversion to is failed