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Numerical investigation of relationship between micro-scale pattern, interfacial plasma structure and feature profile during deep-Si etching in two-frequency capacitively coupled plasmas in SF 6 /O 2
Hamaoka, Fukutaro, Yagisawa, Takashi, Makabe, ToshiakiVolume:
42
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/42/7/075201
Date:
April, 2009
File:
PDF, 581 KB
english, 2009