Ion current to a substrate in the pulsed dc hollow cathode...

Journal of Physics D Applied Physics 2010 / 03 Vol. 43; Iss. 12

Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system

Virostko, P, Hubička, Z, Čada, M, Tichý, M
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Volume:
43
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/43/12/124019
Date:
March, 2010
File:
PDF, 517 KB
english, 2010
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