Characterization of heavy deposits on InP mesa sidewalls...

Semiconductor Science and Technology 1999 / 04 Vol. 14; Iss. 4

Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using plasma

Lee, Byung-Teak, Park, Jong-Sahm, Kim, Dong-Keun, Ahn, Ju-Heon
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Volume:
14
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/14/4/011
Date:
April, 1999
File:
PDF, 356 KB
english, 1999
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