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Lateral oxidation of AlAs layers at elevated water vapour pressure using a closed-chamber system
Choe, Joong-Seon, Park, Si-Hyun, Choe, Byung-Doo, Jeon, HeonsuVolume:
15
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/15/10/102
Date:
October, 2000
File:
PDF, 116 KB
english, 2000