Monitoring of SIMOX layer properties and implantation...

Semiconductor Science and Technology 1987 / 10 Vol. 2; Iss. 10

Monitoring of SIMOX layer properties and implantation temperature by optical measurements

Harbeke, G, Steigmeier, E F, Hemment, P, Reeson, K J, Jastrzebski, L
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Volume:
2
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/2/10/011
Date:
October, 1987
File:
PDF, 423 KB
english, 1987
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