The suppression of residual defects of silicon implanted...

Semiconductor Science and Technology 1987 / 08 Vol. 2; Iss. 8

The suppression of residual defects of silicon implanted with group III, IV and V elements

Hasenack, C M, Souza, J P de, Baumvol, I J R
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Volume:
2
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/2/8/001
Date:
August, 1987
File:
PDF, 708 KB
english, 1987
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