Determination of the surface segregation ratio of P in...

Semiconductor Science and Technology 2007 / 01 Vol. 22; Iss. 1

Determination of the surface segregation ratio of P in Si(1 0 0) during solid-source molecular beam epitaxial growth

Thompson, Phillip E, Jernigan, Glenn G
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Volume:
22
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/22/1/S19
Date:
January, 2007
File:
PDF, 307 KB
english, 2007
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