SiGe wet chemical etchants with high compositional...

Semiconductor Science and Technology 2008 / 08 Vol. 23; Iss. 8

SiGe wet chemical etchants with high compositional selectivity and low strain sensitivity

Stoffel, M, Malachias, A, Merdzhanova, T, Cavallo, F, Isella, G, Chrastina, D, von Känel, H, Rastelli, A, Schmidt, O G
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Volume:
23
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/23/8/085021
Date:
August, 2008
File:
PDF, 991 KB
english, 2008
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