Recrystallisation of amorphous silicon films by rapid...

Semiconductor Science and Technology 1988 / 05 Vol. 3; Iss. 5

Recrystallisation of amorphous silicon films by rapid isothermal and transient annealing

Logan, J R, Dobson, P S, Hill, C, Pearson, P J
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Volume:
3
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/3/5/002
Date:
May, 1988
File:
PDF, 463 KB
english, 1988
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