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Applying computational nanomaterials design to the reactive ion etching of NiO thin films—a preliminary investigation
M. David, R. Muhida, T. Roman, S. Kunikata, W. A. Diño, H. Nakanishi, H. Kasai, F. Takano, H. Shima, H. AkinagaYear:
2007
Language:
english
DOI:
10.1088/0953-8984/19/36/365210
File:
PDF, 226 KB
english, 2007