![](/img/cover-not-exists.png)
Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth
F. Iacopi, P. M. Vereecken, M. Schaekers, M. Caymax, N. Moelans, B. Blanpain, O. Richard, C. Detavernier, H. GriffithsYear:
2007
Language:
english
DOI:
10.1088/0957-4484/18/50/505307
File:
PDF, 1.02 MB
english, 2007