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CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns
G. Gay, T. Baron, C. Agraffeil, B. Salhi, T. Chevolleau, G. Cunge, H. Grampeix, J. Tortai, F. Martin, E. Jalaguier, B. De SalvoYear:
2010
Language:
english
DOI:
10.1088/0957-4484/21/43/435301
File:
PDF, 2.40 MB
english, 2010