![](/img/cover-not-exists.png)
Analysis and modelling of plasma enhanced CVD reactors. I. Two-dimensional treatment of a-Si:H deposition
L. Layeillon, P. Duverneuil, J. P. Couderc, B. DespaxYear:
1994
Language:
english
DOI:
10.1088/0963-0252/3/1/008
File:
PDF, 865 KB
english, 1994