Analysis and modelling of plasma enhanced CVD reactors. I....

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Analysis and modelling of plasma enhanced CVD reactors. I. Two-dimensional treatment of a-Si:H deposition

L. Layeillon, P. Duverneuil, J. P. Couderc, B. Despax
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Year:
1994
Language:
english
DOI:
10.1088/0963-0252/3/1/008
File:
PDF, 865 KB
english, 1994
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