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A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
T. Yamashita, S. Mehta, V. Basker, R. Southwick, A. Kumar, R. Kambhampati, R. Sathiyanarayanan, J. Johnson, T. Hook, S. Cohen, J. Li, A. Madan, Z. Zhu, L. Tai, Y. Yao, P. Chinthamanipeta, M. HopstakenYear:
2015
Language:
english
DOI:
10.1109/VLSIT.2015.7223659
File:
PDF, 393 KB
english, 2015