Development and characterization of ultra high aspect ratio microstructures made by ultra deep X-ray lithography
V. Nazmov, E. Reznikova, J. Mohr, J. Schulz, A. VoigtYear:
2015
Language:
english
DOI:
10.1016/j.jmatprotec.2015.05.030
File:
PDF, 1.95 MB
english, 2015