Development and characterization of ultra high aspect ratio...

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Development and characterization of ultra high aspect ratio microstructures made by ultra deep X-ray lithography

V. Nazmov, E. Reznikova, J. Mohr, J. Schulz, A. Voigt
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Year:
2015
Language:
english
DOI:
10.1016/j.jmatprotec.2015.05.030
File:
PDF, 1.95 MB
english, 2015
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