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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Novel class of highly selective divanillin-based PACs
Medina, Arturo N., Ferreira, Lawrence, Tadros, Sobhy P., Sizensky, Joseph J., Fregeolle, M., Blakeney, Andrew J., Toukhy, Medhat A., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241843
File:
PDF, 425 KB
english, 1996