A heuristic input control method for a single-product, high-volume wafer fabrication process to minimize the number of photomask changes
Ching-Chin Chern, Kwei-Long HuangVolume:
23
Year:
2004
Language:
english
Pages:
16
DOI:
10.1016/s0278-6125(04)80005-0
File:
PDF, 2.08 MB
english, 2004