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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - High-numerical-aperture 193-nm exposure tool
Sewell, Harry, Cote, Daniel R., Williamson, David M., Oskotsky, Mark L., Sakin, Lev, O'Neil, Tim, Zimmerman, John D., Zimmerman, Richard, Nelson, Mike, Mason, Christopher J., Ahouse, David, Harrold, HVolume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435758
File:
PDF, 9.79 MB
english, 2001