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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Controlling etch properties of silicon-based antireflective spin-on hardmask materials
Kim, Sang Kyun, Cho, Hyeon Mo, Woo, Changsoo, Koh, Sang Ran, Kim, Mi-Young, Yoon, Hui Chan, Lee, Woojin, Shin, Seung-Wook, Kim, Jong Seob, Chang, Tuwon, Henderson, Clifford L.Volume:
7273
Year:
2009
DOI:
10.1117/12.814075
File:
PDF, 535 KB
2009