Fabrication and characterization of metal-ferroelectric-insulator-Si diodes and transistors with different HfSiON buffer layer thickness
Lu, Xubing, Ishiwara, Hiroshi, Maruyama, KenjiVolume:
23
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.2008.0336
Date:
October, 2008
File:
PDF, 600 KB
2008