Multilayered ALD HfAlOx and HfO2 for High-Quality Gate...

IEEE Transactions on Device and Materials Reliability 2015 / 6 Vol. 15; Iss. 2

Multilayered ALD HfAlOx and HfO2 for High-Quality Gate Stacks

Bhuyian, Md Nasir Uddin, Misra, Durgamadhab
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Volume:
15
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/TDMR.2015.2424151
Date:
June, 2015
File:
PDF, 916 KB
english, 2015
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