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SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Simulation study of 193-nm phase-shifting masks: analysis of distributed defects of embeded attenuated phase mask (EAPSM)
Karklin, Linard, Behringer, Uwe F. W.Volume:
4764
Year:
2002
Language:
english
DOI:
10.1117/12.479339
File:
PDF, 351 KB
english, 2002