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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - New single-layer positive photoresists for 193-nm photolithography
Okoroanyanwu, Uzodinma, Shimokawa, Tsutomu, Byers, Jeff D., Medeiros, David R., Willson, C. Grant, Niu, Qingshang J., Frechet, Jean M. J., Allen, Robert D., Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275867
File:
PDF, 366 KB
english, 1997