Characterization and removal of polysilicon residue during...

Microelectronic Engineering 2016 / 01 Vol. 149

Characterization and removal of polysilicon residue during wet etching

Ko, Kihyung, Song, Myung-Geun, Jeon, Hayoung, Han, Jungnam, Yoon, Bo Un, Koh, Yongsun, Ahn, Chisung, Kim, Taesung
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Volume:
149
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.09.012
Date:
January, 2016
File:
PDF, 2.23 MB
english, 2016
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