Investigations of nanodimensional Al2O3films deposited by...

Semiconductors 2015 / 7 Vol. 49; Iss. 7

Investigations of nanodimensional Al2O3films deposited by ion-plasma sputtering onto porous silicon

Seredin, P. V., Lenshin, A. S., Goloshchapov, D. L., Lukin, A. N., Arsentyev, I. N., Bondarev, A. D., Tarasov, I. S.
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Volume:
49
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782615070210
Date:
July, 2015
File:
PDF, 1.04 MB
english, 2015
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