EUV source-mask optimization for 7nm node and beyond

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EUV source-mask optimization for 7nm node and beyond

O. R. Wood, E. M. Panning, X. Liu, R. Howell, S. Hsu, K. Yang, K. Gronlund, F. Driessen, H. Liu, S. Hansen, K. Van Ingen Schenau, T. Hollink, P. Van Adrichem, K. Troost, J. Zimmermann, O. Schumann, C.
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Language:
english
DOI:
10.1117/12.2047584
File:
PDF, 1.09 MB
english
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