Etching Characteristics of (Na 0.5 K 0.5 )NbO 3 Thin Films in an Inductively Coupled Cl 2 /Ar Plasma
Kang, Chan Min, Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Chang-IlVolume:
357
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190701542877
Date:
September, 2007
File:
PDF, 1.10 MB
english, 2007