Etching Characteristics of (Na 0.5...

Etching Characteristics of (Na 0.5 K 0.5 )NbO 3 Thin Films in an Inductively Coupled Cl 2 /Ar Plasma

Kang, Chan Min, Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Chang-Il
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Volume:
357
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190701542877
Date:
September, 2007
File:
PDF, 1.10 MB
english, 2007
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