405 nm Laser Thermal Lithography of 40 nm Pattern Using...

Applied Physics Express 2009 / 11 Vol. 2; Iss. 12

405 nm Laser Thermal Lithography of 40 nm Pattern Using Super Resolution Organic Resist Material

Usami, Yoshihisa, Watanabe, Tetsuya, Kanazawa, Yoshinori, Taga, Kazuaki, Kawai, Hiroshi, Ichikawa, Kimio
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Volume:
2
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.2.126502
Date:
November, 2009
File:
PDF, 1.22 MB
english, 2009
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