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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Resist materials design: base-catalyzed chemical amplification
Willson, C. Grant, Cameron, James F., MacDonald, Scott A., Niesert, C. P., Frechet, Jean M. J., Leung, M. K., Ackman, Aaron J., Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154770
File:
PDF, 824 KB
english, 1993