SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Fundamental study of spin-coating using in-situ analysis and simulation
Wallow, Thomas I., Hohle, Christoph K., Harumoto, Masahiko, Yoshida, Jun-ichi, Stokes, Harold, Tanaka, Yuji, Miyagi, Tadashi, Kaneyama, Koji, Pieczulewski, Charles, Asai, MasayaVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085277
File:
PDF, 5.82 MB
english, 2015