SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Novel acid-hardening positive photoresist technology
Graziano, Karen A., Thompson, Stephen D., Winkle, Mark R., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46360
File:
PDF, 952 KB
english, 1991