SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Chemically amplified resists for x-ray and e-beam lithography
Berry, Amanda K., Graziano, Karen A., Thompson, Stephen D., Taylor, James W., Suh, Doowon, Plumb, Dean, Peckerar, Martin C.Volume:
1465
Year:
1991
Language:
english
DOI:
10.1117/12.47358
File:
PDF, 695 KB
english, 1991