SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Polymer-bound photobase generators and photoacid generators for pitch division lithography
Cho, Younjin, Allen, Robert D., Somervell, Mark H., Gu, Xinyu, Hagiwara, Yuji, Kawakami, Takanori, Ogata, Toshiyuki, Rawlings, Brandon, Li, Yongjun, Sundaresan, Arun K., Turro, Nicholas J., Bristol, RVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879771
File:
PDF, 1.48 MB
english, 2011