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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Ionic carbamate photoacid/photobase generators for the advancement of dual-tone photolithography
Hallett-Tapley, Geniece L., Wee, Tse-Luen, Eldo, Joby, Jackson, Edward A., Blackwell, James M., Scaiano, Juan C., Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916496
File:
PDF, 742 KB
english, 2012