Resist Materials for Extreme Ultraviolet Lithography:...

Advanced Materials 2015 / 10 Vol. 27; Iss. 38

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning

Ashby, Paul D., Olynick, Deirdre L., Ogletree, D. Frank, Naulleau, Patrick P.
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Volume:
27
Language:
english
Journal:
Advanced Materials
DOI:
10.1002/adma.201501171
Date:
October, 2015
File:
PDF, 1.02 MB
english, 2015
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