[IEEE 2014 20th International Conference on Ion Implantation Technology (IIT) - Portland, OR, USA (2014.6.26-2014.7.4)] 2014 20th International Conference on Ion Implantation Technology (IIT) - Formation of Source/Drain extension by Antimony implantation for high performance DRAM peripheral transistors
Jaechun Cha,, Seungwoo Jin,, Anbae Lee,, Hun-Sung Lee,, Dongseok Kim,, Jihwan Park,, Ilsik Jang,, Ahyoung Oh,, Se-Aug Jang,, Seoungjin Yeom,, Sungki Park,, Cjay Cho,, Sunny Hwang,, JongwoYear:
2014
Language:
english
DOI:
10.1109/IIT.2014.6940047
File:
PDF, 621 KB
english, 2014