Effects of Mold Geometries and Initial Resist Thickness on...

Journal of Computational and Theoretical Nanoscience 2012 / 08 Vol. 9; Iss. 8

Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography

Du, Jun, Wei, Zhengying, He, Wei, Tang, Yiping
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Volume:
9
Language:
english
Journal:
Journal of Computational and Theoretical Nanoscience
DOI:
10.1166/jctn.2012.2136
Date:
August, 2012
File:
PDF, 3.54 MB
english, 2012
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