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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Overview: continuous evolution on double-patterning process
Yaegashi, Hidetami, Oyama, Kenichi, Hara, Arisa, Natori, Sakurako, Yamauchi, Shohei, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.915695
File:
PDF, 1.97 MB
english, 2012