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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Particle-cluster tin target for a high conversion efficiency LPP source for EUVL
Tomie, Toshihisa, Aota, Tatsuya, Lin, Jing Quan, Ueno, Yoshifumi, Yashiro, Hidehiko, Kandaka, Noriaki, Moriwaki, Hiroki, Niimi, Gohta, Matsushima, Isao, Nishigori, Kentaro, Mackay, R. ScottVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.535395
File:
PDF, 401 KB
english, 2004