Structure dependent resistivity and dielectric...

Applied Surface Science 2015 / 11 Vol. 354

Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

Cristea, D., Crisan, A., Cretu, N., Borges, J., Lopes, C., Cunha, L., Ion, V., Dinescu, M., Barradas, N.P., Alves, E., Apreutesei, M., Munteanu, D.
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Volume:
354
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.06.167
Date:
November, 2015
File:
PDF, 752 KB
english, 2015
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