SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - DSA template mask determination and cut redistribution for advanced 1D gridded design
Xiao, Zigang, Du, Yuelin, Wong, Martin D.F., Zhang, Hongbo, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2025688
File:
PDF, 940 KB
english, 2013