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Modelling and control of plasma etching processes in the semiconductor industry
H. Meng, P.C. Russell, P.J.G. Lisboa, G.R. JonesVolume:
37
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0360-8352(99)00095-9
File:
PDF, 294 KB
english, 1999